Photoluminescence of nc-Si:Er thin films obtained by physical and chemical vapour deposition techniques: The effects os microstructure and chemical composition
Erbium doped nanocrystalline silicon (nc-Si:Er) thin films were produced by reactive magnetron rf sputtering and by Er ion implantation into chemical vapor deposited Si films. The structure and chemical composition of films obtained by the two approaches were studied by micro-Raman scattering, spect...
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| Outros Autores: | , , , , , , |
| Formato: | article |
| Idioma: | eng |
| Publicado em: |
2009
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| Assuntos: | |
| Texto completo: | http://hdl.handle.net/1822/13773 |
| País: | Portugal |
| Oai: | oai:repositorium.sdum.uminho.pt:1822/13773 |