Photoluminescence of nc-Si:Er thin films obtained by physical and chemical vapour deposition techniques: The effects os microstructure and chemical composition

Erbium doped nanocrystalline silicon (nc-Si:Er) thin films were produced by reactive magnetron rf sputtering and by Er ion implantation into chemical vapor deposited Si films. The structure and chemical composition of films obtained by the two approaches were studied by micro-Raman scattering, spect...

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Bibliographic Details
Main Author: Cerqueira, M. F. (author)
Other Authors: Losurdo, M. (author), Stepikhova, M. (author), Alpuim, P. (author), Andrês, G. (author), Kozanecki, A. (author), Soares, Manuel Jorge (author), Peres, M. (author)
Format: article
Language:eng
Published: 2009
Subjects:
Erbium
Nanocrystalline silicon
Photoluminescence
Science & Technology
Online Access:http://hdl.handle.net/1822/13773
Country:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/13773

Internet

http://hdl.handle.net/1822/13773

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