Erbium-doped nanocrystalline silicon thin films produced by RF sputtering - Annealing effect on the Er emission

In the present work, erbium doped nanocrystalline silicon thin films were produced by reactive magnetron sputtering on glass substrates under different conditions (substrate temperature and Er content). The film structure was studied using Raman spectroscopy. The chemical composition was determined...

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Bibliographic Details
Main Author: Cerqueira, M.F. (author)
Other Authors: Monteiro, Teresa (author), Soares, Manuel (author), Kozanecki, A. (author), Alpuim, P. (author), Alves, E. (author)
Format: article
Language:eng
Published: 1000
Subjects:
Annealing effects
Chemical compositions
Crystalline samples
Erbium doped
Film structure
Glass substrates
Low temperatures
matrix
Nano-crystalline silicon thin films
PL intensity
Reactive magnetron sputtering
Rf-sputtering
Substrate temperature
Thermal annealing treatment
Online Access:http://hdl.handle.net/10773/5551
Country:Portugal
Oai:oai:ria.ua.pt:10773/5551

Internet

http://hdl.handle.net/10773/5551

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