ZrOxNy decorative thin films prepared by the reactive gas pulsing process
Zirconium oxynitride thin films were deposited by dc reactive magnetron sputtering. A zirconium metallic target was sputtered in an Ar + N2 + O2 atmosphere. Argon and nitrogen flow rates were maintained constant whereas oxygen was pulsed during the deposition, implementing the reactive gas pulsing p...
| Autor principal: | |
|---|---|
| Outros Autores: | , , , , |
| Formato: | article |
| Idioma: | eng |
| Publicado em: |
2009
|
| Assuntos: | |
| Texto completo: | http://hdl.handle.net/1822/13693 |
| País: | Portugal |
| Oai: | oai:repositorium.sdum.uminho.pt:1822/13693 |