ZrOxNy decorative thin films prepared by the reactive gas pulsing process
Zirconium oxynitride thin films were deposited by dc reactive magnetron sputtering. A zirconium metallic target was sputtered in an Ar + N2 + O2 atmosphere. Argon and nitrogen flow rates were maintained constant whereas oxygen was pulsed during the deposition, implementing the reactive gas pulsing p...
| Main Author: | |
|---|---|
| Other Authors: | , , , , |
| Format: | article |
| Language: | eng |
| Published: |
2009
|
| Subjects: | |
| Online Access: | http://hdl.handle.net/1822/13693 |
| Country: | Portugal |
| Oai: | oai:repositorium.sdum.uminho.pt:1822/13693 |