Etchability dependence of InOx and ITO thin films by plasma enhanced reactive termal evaporation on structural properties and deposition conditions

Indium oxide (InOx) and indium tin oxide (ITO) thin films were deposited on glass substrates by plasma enhanced reactive thermal evaporation (PERTE) at different substrate temperatures. The films were then submitted to two etching solutions with different chemical reactivity: i) HNO3 (6%), at room t...

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Detalhes bibliográficos
Autor principal: Amaral, Ana (author)
Outros Autores: Lavareda, Guilherme (author), Carvalho, Carlos Nunes de (author), Andre, Vania (author), Vygranenko, Yuri (author), Fernandes, Miguel (author), Brogueira, Pedro (author)
Formato: article
Idioma:eng
Publicado em: 2018
Assuntos:
Transparent conductor
Thin film
Plasma deposition
Texto completo:http://hdl.handle.net/10400.21/8800
País:Portugal
Oai:oai:repositorio.ipl.pt:10400.21/8800

Texto Completo

http://hdl.handle.net/10400.21/8800

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