Microstrucure and thermal features a-Si:H and nc-Si:H thin films produced by r.f. sputtering

Amorphous and nanocrystalline silicon thin films have been produced by reactive r.f. sputtering and their microstructure, optical and thermal properties were evaluated. A good correlation was found between the microstructure determined by Raman spectroscopy and X-ray diffraction and the thermal tran...

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Bibliographic Details
Main Author: Thaiyalnayaki, V. (author)
Other Authors: Cerqueira, M. F. (author), Macedo, Francisco (author), Ferreira, J. A. (author)
Format: conferencePaper
Language:eng
Published: 2006
Subjects:
Nanocrystalline silicon
Thermal properties
Structure
Science & Technology
Online Access:http://hdl.handle.net/1822/13970
Country:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/13970
Description
Summary:Amorphous and nanocrystalline silicon thin films have been produced by reactive r.f. sputtering and their microstructure, optical and thermal properties were evaluated. A good correlation was found between the microstructure determined by Raman spectroscopy and X-ray diffraction and the thermal transport parameters

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