Composition and structure variation for magnetron sputtered tantalum oxynitride thin films, as function of deposition parameters

Tantalum oxynitride thin films were produced by magnetron sputtering. The films were deposited usinga pure Ta target and a working atmosphere with a constant N2/O2ratio. The choice of this constant ratiolimits the study concerning the influence of each reactive gas, but allows a deeper understanding...

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Detalhes bibliográficos
Autor principal: Cristea, D. (author)
Outros Autores: Pătru, M. (author), Crisan, A. (author), Munteanu, D. (author), Crăciun, D. (author), Barradas, N. P. (author), Alves, E. (author), Apreutesei, M. (author), Moura, C. (author), Cunha, L. (author)
Formato: article
Idioma:eng
Publicado em: 2015
Assuntos:
Tantalum oxynitride
Sputtering
SEM
RBS
Structure
Ciências Naturais::Ciências Físicas
Science & Technology
Texto completo:http://hdl.handle.net/1822/39767
País:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/39767

Texto Completo

http://hdl.handle.net/1822/39767

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