Composition and structure variation for magnetron sputtered tantalum oxynitride thin films, as function of deposition parameters

Tantalum oxynitride thin films were produced by magnetron sputtering. The films were deposited usinga pure Ta target and a working atmosphere with a constant N2/O2ratio. The choice of this constant ratiolimits the study concerning the influence of each reactive gas, but allows a deeper understanding...

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Bibliographic Details
Main Author: Cristea, D. (author)
Other Authors: Pătru, M. (author), Crisan, A. (author), Munteanu, D. (author), Crăciun, D. (author), Barradas, N. P. (author), Alves, E. (author), Apreutesei, M. (author), Moura, C. (author), Cunha, L. (author)
Format: article
Language:eng
Published: 2015
Subjects:
Tantalum oxynitride
Sputtering
SEM
RBS
Structure
Ciências Naturais::Ciências Físicas
Science & Technology
Online Access:http://hdl.handle.net/1822/39767
Country:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/39767

Internet

http://hdl.handle.net/1822/39767

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