Effect of heat treatment on electrical and surface properties of tungsten oxide thin films grown by HFCVD technique

The present research focuses on the synthesis, characterization, and electrical properties of tungsten oxide thin films deposited using the Hot filament chemical vapor deposition (HFCVD) system on stainless steel 316L substrate. Various characterization tools such as X-ray diffraction (XRD), scannin...

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Bibliographic Details
Main Author: Tan, Guang-Lei (author)
Other Authors: Tang, Dan (author), Dastan, Davoud (author), Jafari, Azadeh (author), Silva, José Pedro Basto (author), Yin, Xi-Tao (author)
Format: article
Language:eng
Published: 2021
Subjects:
Tungsten oxide thin films
Heat treatment
Electrical resistivity
AFM
Raman spectroscopy
HFCVD
Science & Technology
Online Access:http://hdl.handle.net/1822/75001
Country:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/75001

Internet

http://hdl.handle.net/1822/75001

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