Effect of heat treatment on electrical and surface properties of tungsten oxide thin films grown by HFCVD technique

The present research focuses on the synthesis, characterization, and electrical properties of tungsten oxide thin films deposited using the Hot filament chemical vapor deposition (HFCVD) system on stainless steel 316L substrate. Various characterization tools such as X-ray diffraction (XRD), scannin...

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Detalhes bibliográficos
Autor principal: Tan, Guang-Lei (author)
Outros Autores: Tang, Dan (author), Dastan, Davoud (author), Jafari, Azadeh (author), Silva, José Pedro Basto (author), Yin, Xi-Tao (author)
Formato: article
Idioma:eng
Publicado em: 2021
Assuntos:
Tungsten oxide thin films
Heat treatment
Electrical resistivity
AFM
Raman spectroscopy
HFCVD
Science & Technology
Texto completo:http://hdl.handle.net/1822/75001
País:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/75001

Texto Completo

http://hdl.handle.net/1822/75001

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