Characterization of magnetron co-sputtered W-doped C-based films
In this paper, W-doped C-based coatings were deposited on steel and silicon substrates by RF magnetron sputtering, using W and C targets, varying the cathode power applied to the W target and the substrate bias. The chemical composition was varied by placing the substrates in a row facing the C and...
| Autor principal: | |
|---|---|
| Outros Autores: | , |
| Formato: | article |
| Idioma: | eng |
| Publicado em: |
2006
|
| Assuntos: | |
| Texto completo: | http://hdl.handle.net/10316/4218 |
| País: | Portugal |
| Oai: | oai:estudogeral.sib.uc.pt:10316/4218 |