Characterization of magnetron co-sputtered W-doped C-based films
In this paper, W-doped C-based coatings were deposited on steel and silicon substrates by RF magnetron sputtering, using W and C targets, varying the cathode power applied to the W target and the substrate bias. The chemical composition was varied by placing the substrates in a row facing the C and...
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| Other Authors: | , |
| Format: | article |
| Language: | eng |
| Published: |
2006
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| Subjects: | |
| Online Access: | http://hdl.handle.net/10316/4218 |
| Country: | Portugal |
| Oai: | oai:estudogeral.sib.uc.pt:10316/4218 |