Radiation-damage recovery in undoped and oxidized Li doped MgO crystals implanted with lithium ions
Undoped MgO and oxidized Li-doped MgO single crystals were implanted with 1×1017 Li+/cm2 at 175 keV. The Rutherford backscattering spectrometry (RBS)/channeling data obtained after implantation shows that damage was produced throughout the entire range of the implanted ions. Optical absorption measu...
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| Outros Autores: | , , , , , , |
| Formato: | article |
| Idioma: | eng |
| Publicado em: |
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| Assuntos: | |
| Texto completo: | http://hdl.handle.net/10773/6523 |
| País: | Portugal |
| Oai: | oai:ria.ua.pt:10773/6523 |
| Resumo: | Undoped MgO and oxidized Li-doped MgO single crystals were implanted with 1×1017 Li+/cm2 at 175 keV. The Rutherford backscattering spectrometry (RBS)/channeling data obtained after implantation shows that damage was produced throughout the entire range of the implanted ions. Optical absorption measurements indicate that after implantation the most intense band occurs at ≈5.0 eV, which has been associated with anion vacancies. After annealing at 450 K the intensity of the oxygen-vacancy band decreases monotonically with temperature and completely disappears at 950 K. A broad extinction band centered at ≈2.14 eV associated with lithium precipitates emerges gradually and anneals out at 1250 K. RBS/channeling shows that recovery of the implantation damage is completed after annealing the oxidized samples at 1250 K. |
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