Electrochemical characterization of nanostructured Ag:TiN thin films produced by glancing angle deposition on polyurethane substrates for bio-electrode applications

Flexible polyurethane substrates were coated with Ag:TiN thin films (N/Ti atomic ratio = 0.7; 10 at.% Ag), with different column inclinations (α = 0°, 40° and 80°) and architectures (columnar, zigzag with 2 and 4 periods), using the Glancing Angle Deposition (GLAD) technique. The coatings were chara...

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Detalhes bibliográficos
Autor principal: Pedrosa, Paulo (author)
Outros Autores: Machado, Diogo (author), Fiedler, Patrique (author), Vasconcelos, Beatriz (author), Alves, Eduardo (author), Barradas, Nuno P. (author), Martin, Nicolas (author), Haueisen, Jens (author), Vaz, F. (author), Fonseca, Carlos (author)
Formato: article
Idioma:eng
Publicado em: 2016
Assuntos:
Electrochemical impedance spectroscopy
Voltammetry
TiN
Ag-doping
Glancing angle deposition
Dry electrode
Ciências Naturais::Ciências Físicas
Science & Technology
Texto completo:http://hdl.handle.net/1822/43912
País:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/43912

Texto Completo

http://hdl.handle.net/1822/43912

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