Role of oxygen additive on hydrogen impurity incorporation in nanocrystalline diamond films fabricated by microwave plasma chemical vapor deposition

In this work, we study the influence of oxygen additive in the gas phase on hydrogen impurity incorporation into thick nanocrystalline diamond (NCD) films. Various diamond samples were grown on large silicon wafers of 5.08 cm diameter by adjusting the amount of oxygen and nitrogen additives into a c...

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Detalhes bibliográficos
Autor principal: Tang, C. G. (author)
Outros Autores: Gu, L. G. (author), Grácio, J. (author), Ribeiro, J. L. (author)
Formato: article
Idioma:eng
Publicado em: 2009
Assuntos:
Texto completo:http://hdl.handle.net/1822/13921
País:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/13921