Role of oxygen additive on hydrogen impurity incorporation in nanocrystalline diamond films fabricated by microwave plasma chemical vapor deposition
In this work, we study the influence of oxygen additive in the gas phase on hydrogen impurity incorporation into thick nanocrystalline diamond (NCD) films. Various diamond samples were grown on large silicon wafers of 5.08 cm diameter by adjusting the amount of oxygen and nitrogen additives into a c...
Autor principal: | |
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Outros Autores: | , , |
Formato: | article |
Idioma: | eng |
Publicado em: |
2009
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Assuntos: | |
Texto completo: | http://hdl.handle.net/1822/13921 |
País: | Portugal |
Oai: | oai:repositorium.sdum.uminho.pt:1822/13921 |