XPS analysis of ZnO: ga films deposited by magnetron sputtering: substrate bias effect

This work focuses on X-ray photoelectron spectroscopy (XPS) and combined Raman and photoluminescence experiments performed on ∼500 nm thick ZnO:Ga films deposited by magnetron sputtering. The substrate bias voltage applied during the deposition was varied between 0 V (grounded) and −120 V in order t...

Full description

Bibliographic Details
Main Author: Correia, Filipe Costa (author)
Other Authors: Bundaleski, N. (author), Teodoro, Omnd M. N. D. (author), Correia, M. R. (author), Rebouta, L. (author), Mendes, A. (author), Tavares, C. J. (author)
Format: article
Language:eng
Published: 2018
Subjects:
GZO
Gallium
Zinc oxide
Sputtering
Electrical properties
XPS
Bias voltage
Science & Technology
Online Access:http://hdl.handle.net/1822/72406
Country:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/72406

Internet

http://hdl.handle.net/1822/72406

Similar Items