XPS analysis of ZnO: ga films deposited by magnetron sputtering: substrate bias effect

This work focuses on X-ray photoelectron spectroscopy (XPS) and combined Raman and photoluminescence experiments performed on ∼500 nm thick ZnO:Ga films deposited by magnetron sputtering. The substrate bias voltage applied during the deposition was varied between 0 V (grounded) and −120 V in order t...

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Detalhes bibliográficos
Autor principal: Correia, Filipe Costa (author)
Outros Autores: Bundaleski, N. (author), Teodoro, Omnd M. N. D. (author), Correia, M. R. (author), Rebouta, L. (author), Mendes, A. (author), Tavares, C. J. (author)
Formato: article
Idioma:eng
Publicado em: 2018
Assuntos:
GZO
Gallium
Zinc oxide
Sputtering
Electrical properties
XPS
Bias voltage
Science & Technology
Texto completo:http://hdl.handle.net/1822/72406
País:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/72406

Texto Completo

http://hdl.handle.net/1822/72406

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