Influence of the deposition pressure on the properties of transparent and conductive ZnO: Ga thin-film produced by r.f. sputtering at room temperature

Thin Solid Films, vol. 427, nº 1-2

Detalhes bibliográficos
Autor principal: Fortunato, Elvira (author)
Outros Autores: Assunção, V. (author), Marques, A. (author), Águas, Hugo (author), Martins, Rodrigo (author), Costa, M. E. V. (author)
Formato: article
Idioma:eng
Publicado em: 2010
Assuntos:
Gallium
Zinc oxide
Thin-film
Magnetron sputtering
Transparent conductive oxide
Texto completo:http://hdl.handle.net/10362/3263
País:Portugal
Oai:oai:run.unl.pt:10362/3263

Texto Completo

http://hdl.handle.net/10362/3263

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