Study on pulsed DC-sputtering of iridium oxide for implantable electrodes

A pulsed-DC reactive sputtering technique was used for iridium oxide thin-film deposition. Frequency, pulse width, oxygen flow and deposition time were changed over several deposition sessions, regarding implantable electrode applications. Surface and electrochemistry analysis were performed for dep...

Full description

Bibliographic Details
Main Author: Dias, N. S. (author)
Other Authors: Silva, A. F. (author), Van Ooyen, A. (author), Mendes, P. M. (author), Afonso, José A. (author), Correia, J. H. (author), Mokwa, W. (author), Schnakenberg, U. (author)
Format: conferencePaper
Language:eng
Published: 2007
Subjects:
IrOx Sputtering
Implantable electrodes
Online Access:http://hdl.handle.net/1822/19105
Country:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/19105

Internet

http://hdl.handle.net/1822/19105

Similar Items