Study on pulsed DC-sputtering of iridium oxide for implantable electrodes

A pulsed-DC reactive sputtering technique was used for iridium oxide thin-film deposition. Frequency, pulse width, oxygen flow and deposition time were changed over several deposition sessions, regarding implantable electrode applications. Surface and electrochemistry analysis were performed for dep...

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Detalhes bibliográficos
Autor principal: Dias, N. S. (author)
Outros Autores: Silva, A. F. (author), Van Ooyen, A. (author), Mendes, P. M. (author), Afonso, José A. (author), Correia, J. H. (author), Mokwa, W. (author), Schnakenberg, U. (author)
Formato: conferencePaper
Idioma:eng
Publicado em: 2007
Assuntos:
IrOx Sputtering
Implantable electrodes
Texto completo:http://hdl.handle.net/1822/19105
País:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/19105

Texto Completo

http://hdl.handle.net/1822/19105

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