Lithographic mask defects analysis on an MMI 3 dB splitter

PTDC/NAN-OPT/31311/2017 SFRH/BPD/102217/2014 IPL IDI&CA/2018/aSiPhoto.

Bibliographic Details
Main Author: Lourenço, Paulo (author)
Other Authors: Fantoni, Alessandro (author), Costa, João (author), Vieira, Manuela (author)
Format: article
Language:eng
Published: 2020
Subjects:
Online Access:http://hdl.handle.net/10362/104752
Country:Portugal
Oai:oai:run.unl.pt:10362/104752