Structural stability of decorative ZrNxOy thin films

ZrNxOy thin films were prepared by rf reactive magnetron sputtering. The thermal stability of the coatings was tested in vacuum for an annealing time of 1 h in the temperature range 400-800 °C. Residual stresses originated by the deposition process were partially or almost completely released with...

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Bibliographic Details
Main Author: Carvalho, P. (author)
Other Authors: Vaz, F. (author), Rebouta, L. (author), Carvalho, S. (author), Cunha, L. (author), Goudeau, Ph. (author), Rivière, J. P. (author), Alves, E. (author), Cavaleiro, A. (author)
Format: article
Language:eng
Published: 2005
Subjects:
Sputtering
Zirconium nitride
Thermal degradation
Online Access:http://hdl.handle.net/10316/4236
Country:Portugal
Oai:oai:estudogeral.sib.uc.pt:10316/4236

Internet

http://hdl.handle.net/10316/4236

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