Structural stability of decorative ZrNxOy thin films

ZrNxOy thin films were prepared by rf reactive magnetron sputtering. The thermal stability of the coatings was tested in vacuum for an annealing time of 1 h in the temperature range 400-800 °C. Residual stresses originated by the deposition process were partially or almost completely released with...

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Detalhes bibliográficos
Autor principal: Carvalho, P. (author)
Outros Autores: Vaz, F. (author), Rebouta, L. (author), Carvalho, S. (author), Cunha, L. (author), Goudeau, Ph. (author), Rivière, J. P. (author), Alves, E. (author), Cavaleiro, A. (author)
Formato: article
Idioma:eng
Publicado em: 2005
Assuntos:
Sputtering
Zirconium nitride
Thermal degradation
Texto completo:http://hdl.handle.net/10316/4236
País:Portugal
Oai:oai:estudogeral.sib.uc.pt:10316/4236

Texto Completo

http://hdl.handle.net/10316/4236

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