Indium tin oxide thin films prepared by ion beam assisted deposition technique at different ion beam currents
Indium tin oxide (ITO) films have been deposited onto glass substrates at room temperature by ion beam assisted deposition technique (IBAD) at different ion beam currents (80 mA – 120 mA). The effect of the ion beam current on films properties has been studied. The films prepared at low ion beam cur...
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| Outros Autores: | , , |
| Formato: | article |
| Idioma: | eng |
| Publicado em: |
2008
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| Assuntos: | |
| Texto completo: | http://hdl.handle.net/1822/13695 |
| País: | Portugal |
| Oai: | oai:repositorium.sdum.uminho.pt:1822/13695 |