Erbium-doped silicon nanocrystals grown by r.f. sputtering method: Competition between oxygen and silicon to get erbium

Erbium doped micro- and nanocrystalline silicon thin films have been deposited by co-sputtering of Er and Si. Films with different crystallinity, crystallite size, hydrogen and oxygen content have been obtained in order to investigate the effect of the microstructure and composition of matrix on the...

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Bibliographic Details
Main Author: Cerqueira, M.F. (author)
Other Authors: Stepikhova, M. (author), Losurdo, M. (author), Giangregorio, M.M. (author), Kozanecki, A. (author), Monteiro, T. (author)
Format: article
Language:eng
Published: 1000
Subjects:
Erbium-doping
nc-Si
Optical properties
Spectroscopic ellipsometry
Thin films
Online Access:http://hdl.handle.net/10773/6476
Country:Portugal
Oai:oai:ria.ua.pt:10773/6476

Internet

http://hdl.handle.net/10773/6476

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