Synthesis, structural and mechanical characterization of sputtered tungsten oxide coatings
Tungsten oxide coatings were deposited without substrate bias by DC reactive magnetron sputtering of a tungsten target using oxygen as reactive gas. By tuning the partial pressure of oxygen (pO2/pAr) between 0 and 4, the oxygen content of the films was changed from 0 to 75 at.%. The structure of the...
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| Outros Autores: | , |
| Formato: | article |
| Idioma: | eng |
| Publicado em: |
2006
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| Assuntos: | |
| Texto completo: | http://hdl.handle.net/10316/4224 |
| País: | Portugal |
| Oai: | oai:estudogeral.sib.uc.pt:10316/4224 |