Synthesis, structural and mechanical characterization of sputtered tungsten oxide coatings

Tungsten oxide coatings were deposited without substrate bias by DC reactive magnetron sputtering of a tungsten target using oxygen as reactive gas. By tuning the partial pressure of oxygen (pO2/pAr) between 0 and 4, the oxygen content of the films was changed from 0 to 75 at.%. The structure of the...

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Bibliographic Details
Main Author: Parreira, N. M. G. (author)
Other Authors: Carvalho, N. J. M. (author), Cavaleiro, A. (author)
Format: article
Language:eng
Published: 2006
Subjects:
Tungsten oxide
Reactive sputtering
Structural properties
Mechanical properties
Online Access:http://hdl.handle.net/10316/4224
Country:Portugal
Oai:oai:estudogeral.sib.uc.pt:10316/4224
Description
Summary:Tungsten oxide coatings were deposited without substrate bias by DC reactive magnetron sputtering of a tungsten target using oxygen as reactive gas. By tuning the partial pressure of oxygen (pO2/pAr) between 0 and 4, the oxygen content of the films was changed from 0 to 75 at.%. The structure of the films (investigated by X-ray diffraction) depends on their oxygen content. For low oxygen contents, the [alpha]-W and [beta]-W3O phases were observed (< 30 at.%), and with the increase of oxygen content (30 at.% < O < 67 at.%) the structure became amorphous. A transition region was obtained for oxygen content between 67 at.% and 75 at.%, and when O > 75 at.%, a nanocrystalline (WO3) structure was reached.

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