Microcrystalline silicon thin films prepared by RF reactive magnetron sputter deposition
Hydrogenated microcrystalline silicon (microc-Si:H) thin films with Cu as a dopant material (about 2 wt.%) were deposited by RF planar magnetron sputtering in an argon/hydrogen plasma. The composition and microstructure of the films were analysed by SEM, ERD/RBS, X-ray diffraction and Raman spectros...
| Autor principal: | |
|---|---|
| Outros Autores: | , , , |
| Formato: | article |
| Idioma: | eng |
| Publicado em: |
1995
|
| Assuntos: | |
| Texto completo: | http://hdl.handle.net/1822/14188 |
| País: | Portugal |
| Oai: | oai:repositorium.sdum.uminho.pt:1822/14188 |