Microcrystalline silicon thin films prepared by RF reactive magnetron sputter deposition

Hydrogenated microcrystalline silicon (microc-Si:H) thin films with Cu as a dopant material (about 2 wt.%) were deposited by RF planar magnetron sputtering in an argon/hydrogen plasma. The composition and microstructure of the films were analysed by SEM, ERD/RBS, X-ray diffraction and Raman spectros...

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Bibliographic Details
Main Author: Cerqueira, M. F. (author)
Other Authors: Andritschky, M. (author), Rebouta, L. (author), Ferreira, J. A. (author), Silva, M. F. (author)
Format: article
Language:eng
Published: 1995
Subjects:
Hydrogenated microcrystalline silicon
Magnetron sputtering
X-ray diffraction
Raman spectroscopy
Science & Technology
Online Access:http://hdl.handle.net/1822/14188
Country:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/14188

Internet

http://hdl.handle.net/1822/14188

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