The annealing effect on structural and optical properties of ZnO thin films produced by RF sputtering
In this work, a study of the structure and optical properties of undoped ZnO thin films produced by r.f. magnetron sputtering technique as a function of the growth parameters is reported. Modification under annealing conditions is also analysed. Raman spectroscopy, X-ray photoelectron spectroscopy,...
Autor principal: | |
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Outros Autores: | , , , |
Formato: | article |
Idioma: | eng |
Publicado em: |
2007
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Assuntos: | |
Texto completo: | http://hdl.handle.net/1822/13774 |
País: | Portugal |
Oai: | oai:repositorium.sdum.uminho.pt:1822/13774 |
Resumo: | In this work, a study of the structure and optical properties of undoped ZnO thin films produced by r.f. magnetron sputtering technique as a function of the growth parameters is reported. Modification under annealing conditions is also analysed. Raman spectroscopy, X-ray photoelectron spectroscopy, X-ray diffraction and optical transmittance have been used. From the position of the (002) X-ray diffraction peak and the E2 (high) mode detected in Raman spectra, the residual stress both in the as-grown and in the annealed samples has been estimated. |
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