Influence of the sputtering pressure on the morphological features and electrical resistivity anisotropy of nanostructured titanium films

Titanium films were DC sputtered with a particle flux incidence angle of 80 degrees, using the Glancing Angle Deposition (GLAD) technique with increasing sputtering pressures from 0.2 to 1.5 Pa. This range of pressures is typically implemented for the deposition of thin films by the magnetron sputte...

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Bibliographic Details
Main Author: Pedrosa, Paulo Eduardo Teixeira Baptista (author)
Other Authors: Ferreira, Armando José Barros (author), Cote, Jean-Marc (author), Martin, Nicolas (author), Yazdi, Mohammad Arab Pour (author), Billard, Alain (author), Lanceros-Méndez, S. (author), Vaz, F. (author)
Format: article
Language:eng
Published: 2017
Subjects:
Glancing angle deposition
Titanium
Nanostructured films
Anisotropy
Electrical resistivity
Science & Technology
Online Access:http://hdl.handle.net/1822/52580
Country:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/52580

Internet

http://hdl.handle.net/1822/52580

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