Influence of the sputtering pressure on the morphological features and electrical resistivity anisotropy of nanostructured titanium films

Titanium films were DC sputtered with a particle flux incidence angle of 80 degrees, using the Glancing Angle Deposition (GLAD) technique with increasing sputtering pressures from 0.2 to 1.5 Pa. This range of pressures is typically implemented for the deposition of thin films by the magnetron sputte...

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Detalhes bibliográficos
Autor principal: Pedrosa, Paulo Eduardo Teixeira Baptista (author)
Outros Autores: Ferreira, Armando José Barros (author), Cote, Jean-Marc (author), Martin, Nicolas (author), Yazdi, Mohammad Arab Pour (author), Billard, Alain (author), Lanceros-Méndez, S. (author), Vaz, F. (author)
Formato: article
Idioma:eng
Publicado em: 2017
Assuntos:
Glancing angle deposition
Titanium
Nanostructured films
Anisotropy
Electrical resistivity
Science & Technology
Texto completo:http://hdl.handle.net/1822/52580
País:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/52580

Texto Completo

http://hdl.handle.net/1822/52580

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