Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands

Physical vapour deposition (PVD) is a well-known technology that is widely used for the deposition of thin films regarding many demands, namely tribological behaviour improvement, optical enhancement, visual/esthetic upgrading, and many other fields, with a wide range of applications already being p...

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Bibliographic Details
Main Author: Baptista, Andresa (author)
Other Authors: Silva, F.J.G. (author), Porteiro, Jacobo (author), Míguez, José (author), Pinto, Gustavo Filipe (author)
Format: article
Language:eng
Published: 2020
Subjects:
PVD optimization process
PVD technique
Sputtering
Magnetron sputtering
Deposition improvement
Reactors
Online Access:http://hdl.handle.net/10400.22/15871
Country:Portugal
Oai:oai:recipp.ipp.pt:10400.22/15871

Internet

http://hdl.handle.net/10400.22/15871

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