Physical and morphological characterization of reactively magnetron sputtered TiN films

The present paper reports the influence of growth conditions on the properties of TiN thin films deposited by rf reactive magnetron sputtering in the low-pressure range. The effects of rf power at the Ti target and the negative bias voltage at the substrate in the morphology, structure, electrical r...

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Bibliographic Details
Main Author: Vaz, F. (author)
Other Authors: Machado, P. (author), Rebouta, L. (author), Mendes, J. A. (author), Lanceros-Méndez, S. (author), Cunha, L. (author), Nascimento, Sérgio M. C. (author), Goudeau, Ph. (author), Rivière, J. P. (author), Alves, E. (author), Sidor, A. (author)
Format: article
Language:eng
Published: 2002
Subjects:
Magnetron sputtering
Rf power
TiN films
Science & Technology
Online Access:http://hdl.handle.net/1822/3621
Country:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/3621

Internet

http://hdl.handle.net/1822/3621

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