Structural studies and influence of the structure on the electrical and optical properties of microcrystalline silicon thin films produced by RF sputtering

Microcrystalline silicon thin films were produced by reactive magnetron sputtering on glass substrates under several different conditions (RF power and gas mixture composition). The film structure was studied by X-ray diffractometry (XRD), transmission electron microscopy (TEM) and Raman spectroscop...

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Bibliographic Details
Main Author: Cerqueira, M. F. (author)
Other Authors: Ferreira, J. A. (author), Adriaenssens, G. J. (author)
Format: article
Language:eng
Published: 2000
Subjects:
Microcrystalline silicon
Raman scattering
X-ray diffraction
Transmission electron microscopy
Absorption coefficient
Conductivity
Science & Technology
Online Access:http://hdl.handle.net/1822/14162
Country:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/14162

Internet

http://hdl.handle.net/1822/14162

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