Structural studies and influence of the structure on the electrical and optical properties of microcrystalline silicon thin films produced by RF sputtering
Microcrystalline silicon thin films were produced by reactive magnetron sputtering on glass substrates under several different conditions (RF power and gas mixture composition). The film structure was studied by X-ray diffractometry (XRD), transmission electron microscopy (TEM) and Raman spectroscop...
| Autor principal: | |
|---|---|
| Outros Autores: | , |
| Formato: | article |
| Idioma: | eng |
| Publicado em: |
2000
|
| Assuntos: | |
| Texto completo: | http://hdl.handle.net/1822/14162 |
| País: | Portugal |
| Oai: | oai:repositorium.sdum.uminho.pt:1822/14162 |