Elastic properties of (Ti,Al,Si)N nanocomposite films

(Ti,Al,Si)N films have been prepared by d.c. and rf reactive magnetron sputtering, with Si contents in the range 2-11 at.% and Al contents between 4 and 19 at.%. Samples prepared in rotation mode (three magnetrons) presented densities between 4.0 and 4.6 g/cm3, while samples prepared in static mode...

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Detalhes bibliográficos
Autor principal: Carvalho, S. (author)
Outros Autores: Vaz, F. (author), Rebouta, L. (author), Schneider, D. (author), Cavaleiro, A. (author), Alves, E. (author)
Formato: article
Idioma:eng
Publicado em: 2001
Assuntos:
Texto completo:http://hdl.handle.net/10316/4292
País:Portugal
Oai:oai:estudogeral.sib.uc.pt:10316/4292