Growth of the [110] oriented TiO2 nanorods on ITO substrates by sputtering technique for dye-sensitized solar cells

TiO2 films have been deposited on ITO substrates by dc reactive magnetron sputtering technique. It has been found that the sputtering pressure is a very important parameter for the structure of the deposited TiO2 films. When the pressure is lower than 1 Pa, the deposited has a dense structure and sh...

Full description

Bibliographic Details
Main Author: Meng, Lijian (author)
Other Authors: Chen, Hong (author), Li, Can (author), Santos, M. P. (author)
Format: article
Language:eng
Published: 2014
Subjects:
TiO2
DSSC
Nanorod
Structural properties
Sputtering
Online Access:http://hdl.handle.net/10400.22/4940
Country:Portugal
Oai:oai:recipp.ipp.pt:10400.22/4940

Internet

http://hdl.handle.net/10400.22/4940

Similar Items