Influence of substrate temperature and post-annealing treatment on the microstructure and electric properties of ZnO:Al thin films deposited by sputtering

In this work, it is reported the characterization of the microstructure and electric properties of ZnO:Al thin films produced by magnetron sputtering. An AZOY sputtering target (98 wt% ZnO + 2 wt% Al2O3) was used as source material. The microstructure, optical and electrical properties of ZnO:Al thi...

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Bibliographic Details
Main Author: Garcia, Cibeli Navarro Belletti (author)
Other Authors: Ariza, E. (author), Tavares, C. J. (author)
Format: conferencePaper
Language:eng
Published: 2013
Subjects:
ZnO:Al
Sputtering
EBSD
TCO
Science & Technology
Online Access:http://hdl.handle.net/1822/21799
Country:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/21799

Internet

http://hdl.handle.net/1822/21799

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