Influence of substrate temperature and post-annealing treatment on the microstructure and electric properties of ZnO:Al thin films deposited by sputtering
In this work, it is reported the characterization of the microstructure and electric properties of ZnO:Al thin films produced by magnetron sputtering. An AZOY sputtering target (98 wt% ZnO + 2 wt% Al2O3) was used as source material. The microstructure, optical and electrical properties of ZnO:Al thi...
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| Outros Autores: | , |
| Formato: | conferencePaper |
| Idioma: | eng |
| Publicado em: |
2013
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| Assuntos: | |
| Texto completo: | http://hdl.handle.net/1822/21799 |
| País: | Portugal |
| Oai: | oai:repositorium.sdum.uminho.pt:1822/21799 |