Properties of tantalum oxynitride thin films produced by magnetron sputtering: the influence of processing parameters

The main purpose of this work is to present and to interpret the change of structure and physical properties of tantalum oxynitride (TaNxOy) thin films, produced by dc reactive magnetron sputtering, by varying the processing parameters. A set of TaNxOy films was prepared by varying the reactive gase...

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Detalhes bibliográficos
Autor principal: Cristea, D. (author)
Outros Autores: Constantin, D. G. (author), Crisan, A. (author), Abreu, C. S. (author), Gomes, J. R. (author), Barradas, N. P. (author), Alves, E. (author), Moura, C. (author), Vaz, F. (author), Cunha, L. (author)
Formato: article
Idioma:eng
Publicado em: 2013
Assuntos:
Tantalum oxynitride
Structure
Optical properties
Tribological behaviour
Science & Technology
Texto completo:http://hdl.handle.net/1822/27156
País:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/27156

Texto Completo

http://hdl.handle.net/1822/27156

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