Growth of the [110] orientedTiO2 nanorods on ITO substrates by sputtering technique for dye-sensitized solar cells
TiO2 films have been deposited on ITO substrates by DC reactive magnetron sputtering technique. It has been found that the sputtering pressure is a very important parameter for the structure of the deposited TiO2 films. When the pressure is lower than 1 Pa, the deposited film has a dense structure a...
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| Outros Autores: | , , |
| Formato: | article |
| Idioma: | eng |
| Publicado em: |
2015
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| Assuntos: | |
| Texto completo: | http://hdl.handle.net/10174/13571 |
| País: | Portugal |
| Oai: | oai:dspace.uevora.pt:10174/13571 |