Growth of the [110] orientedTiO2 nanorods on ITO substrates by sputtering technique for dye-sensitized solar cells

TiO2 films have been deposited on ITO substrates by DC reactive magnetron sputtering technique. It has been found that the sputtering pressure is a very important parameter for the structure of the deposited TiO2 films. When the pressure is lower than 1 Pa, the deposited film has a dense structure a...

Full description

Bibliographic Details
Main Author: Meng, Lijian (author)
Other Authors: Chen, Hong (author), Li, Can (author), Dos Santos, Manuel Pereira (author)
Format: article
Language:eng
Published: 2015
Subjects:
TiO2
DSSC
nanorod
structural property
sputtering
Online Access:http://hdl.handle.net/10174/13571
Country:Portugal
Oai:oai:dspace.uevora.pt:10174/13571

Internet

http://hdl.handle.net/10174/13571

Similar Items