Properties of CrN thin films deposited in plasma-activated ABS by reactive magnetron sputtering

In this work, magnetron sputtered CrNx thin films with nitrogen concentrations ranging from 17 to 30 at.% were deposited on plasma activated ABS. Two sets of thin films were obtained by varying the N-2 flow inside the vacuum chamber (series #1) and the deposition time (series #2). The polymer sample...

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Bibliographic Details
Main Author: Pedrosa, Paulo Eduardo Teixeira Baptista (author)
Other Authors: Rodrigues, Marco S. (author), Neto, Miguel A. (author), Oliveira, Filipe J. (author), Silva, Rui F. (author), Borges, Joel Nuno Pinto (author), Amaral, Margarida (author), Ferreira, Antonio (author), Godinho, Luis H. (author), Carvalho, Sandra (author), Vaz, F. (author)
Format: article
Language:eng
Published: 2018
Subjects:
Sputtering
Chromium nitride
ABS
Metallization
Polymer coating
Science & Technology
Online Access:http://hdl.handle.net/1822/55849
Country:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/55849

Internet

http://hdl.handle.net/1822/55849

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