Properties of CrN thin films deposited in plasma-activated ABS by reactive magnetron sputtering

In this work, magnetron sputtered CrNx thin films with nitrogen concentrations ranging from 17 to 30 at.% were deposited on plasma activated ABS. Two sets of thin films were obtained by varying the N-2 flow inside the vacuum chamber (series #1) and the deposition time (series #2). The polymer sample...

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Detalhes bibliográficos
Autor principal: Pedrosa, Paulo Eduardo Teixeira Baptista (author)
Outros Autores: Rodrigues, Marco S. (author), Neto, Miguel A. (author), Oliveira, Filipe J. (author), Silva, Rui F. (author), Borges, Joel Nuno Pinto (author), Amaral, Margarida (author), Ferreira, Antonio (author), Godinho, Luis H. (author), Carvalho, Sandra (author), Vaz, F. (author)
Formato: article
Idioma:eng
Publicado em: 2018
Assuntos:
Sputtering
Chromium nitride
ABS
Metallization
Polymer coating
Science & Technology
Texto completo:http://hdl.handle.net/1822/55849
País:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/55849

Texto Completo

http://hdl.handle.net/1822/55849

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