In-situ XRD vs ex-situ vacuum annealing of tantalum oxynitride thin films: Assessments on the structural evolution

The purpose of this work is to discuss the main structural characteristics of a group of tantalum oxynitride (TaNxOy) thin films, with different compositions, prepared by magnetron sputtering, and to interpret and compare the structural changes, by X-ray diffraction (XRD), when the samples are vacuu...

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Bibliographic Details
Main Author: Cunha, L. (author)
Other Authors: Apreutesei, M. (author), Moura, C. (author), Alves, E. (author), Barradas, N. P. (author), Cristea, D. (author)
Format: article
Language:eng
Published: 2018
Subjects:
Tantalum oxynitride
XRD
Thermal annealing
Structural stability
Tantalum oxyrntride
Engenharia e Tecnologia::Engenharia dos Materiais
Science & Technology
Online Access:http://hdl.handle.net/1822/47846
Country:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/47846

Internet

http://hdl.handle.net/1822/47846

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