Oxide transistors produced by solution: Influence of annealing parameters on properties of the insulator

Solution processing of amorphous metal oxides has been lately used as an option to implement in flexible electronics allowing to reduce the associated costs and get a better performance. However the research has focused more on semiconductor layer instead of focusing on the insulator layer that is r...

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Bibliographic Details
Main Author: Carlos, Emanuel Abreu Antunes (author)
Format: masterThesis
Language:eng
Published: 2017
Subjects:
Aluminum oxide
Combustion reaction
FUV irradiation
Low temperature
Solution TFTs
Low operating voltage
Domínio/Área Científica::Engenharia e Tecnologia::Engenharia dos Materiais
Online Access:http://hdl.handle.net/10362/19799
Country:Portugal
Oai:oai:run.unl.pt:10362/19799

Internet

http://hdl.handle.net/10362/19799

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