Electrical and photocatalytic behaviour of TAOxNy magnetron sputtered thin solid films

Tantalum oxynitride thin films were deposited by reactive magnetron sputtering in a N2+O2 (85%+15%) atmosphere, with increasing total reactive gas flows. The chemical composition was determined by RBS and the structural development by XRD. The electrical resistivity was measured using the 2-point an...

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Detalhes bibliográficos
Autor principal: Cristea, D. (author)
Outros Autores: Crisan, A. (author), Barradas, N. P. (author), Alves, E. (author), Costa, P. (author), Lanceros-Méndez, S. (author), Cunha, L. (author)
Formato: article
Idioma:eng
Publicado em: 2013
Assuntos:
Tantalum oxynitride
Sputtering
Thin films
Science & Technology
Texto completo:http://hdl.handle.net/1822/27167
País:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/27167

Texto Completo

http://hdl.handle.net/1822/27167

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