Characterization of TiCN thin films deposited by Dc-Pulsed PACVD using methane precursor

Titanium carbonitride (TiCN) thin films were deposited on hot-work steel (DIN 1.2606) by plasma-assisted chemical vapor deposition (PACVD) and the influence of different CH4/ (CH4+N2) gas flow ratio, on the layer mechanical properties, were investigated. SEM studies indicated that the growth rate is...

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Bibliographic Details
Main Author: Shafiei,Seyed Mohammad Mahdi (author)
Other Authors: Divandari,Mehdi (author), Boutorabi,Seyed Mohammad Ali (author), Naghizadeh,Rahim (author)
Format: article
Language:eng
Published: 2014
Subjects:
Online Access:http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392014000600037
Country:Brazil
Oai:oai:scielo:S1516-14392014000600037